Nanopatterning using AFM

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Information about Nanopatterning using AFM
Science-Technology

Published on June 1, 2008

Author: momugan

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Nanopatterning Using AFM As A tool : Nanopatterning Using AFM As A tool Veerapandian Murugan 200840152 Kyungwon university College of Bionanotechnology OVERVIEW : OVERVIEW Introduction Nanopatterning Role of AFM Methods Results and discussion Conclusion Introduction : Introduction Nanopatterning High density recording systems Photolithography involves- many steps and uses toxic reagents Direct patterning- energy beam or scanning probe microscope Direct patterning technique for fabrication of nanopatterns -scratching (material like aluminum) by AFM AFM and Nanoindentation combination characterize- patterns and the hardness (H). leads “Probe-Based Data Storage” Role of AFM : Role of AFM Fundamental tool-surface imaging and characterization Nanofabrication -contact force pulses by cantilever (high spring constant, loading, and scratching) AFM nanolithography- several types of well-defined shapes, like pits and lines Patterned structures were correlated with the nanolithography parameters (e.g. applied force). Contact mode operation-nanolithography of soft materials Methods of experiments : Methods of experiments Nanopatterning on aluminum surfaces Covered with anodic oxide films Scratching by silicon probe tip of AFM In pure water, CuSO4 solutions, Cu-electroless plating solutions and diluted NaOH solutions NaOH>CuSO4>pure water>Cu-electroless solution, and increased with increasing probe load and scratch number Wear of the silicon probe tip (NaOH>pure H20)by scratching in pure water and NaOH solution Silicon tip with polycrystalline diamond (high processing capability and wear resistance). Slide 6: Rgd during scratching (a) Solutions II and IV, (b) Solutions I and (c) Solution III specimens scratched (1) n=100, (2) 200, (3) 800 and (4) 1600 times with a silicon tip probe at F=6 µN, V=50 µm s¯1 in Solution I. Processing rate with diamond tip : Processing rate with diamond tip Change in the depth, D, of grooves with load, F, obtained by scratching with n=1600 and v=50 µm s¯1 in Solutions I, II, III and IV Change in the depth, D, of grooves with load, F, obtained by scratching with n=1600 and v=50 µm s¯1with diamond tip in Solutions I and III Processing rate with silicon tip Slide 8: Grooves can be fabricated effectively, depth-controlled by probe load, scratch number, solution pH and chemical composition The Rgd with force applied to the probe, depending on the solution composition and pH (dissolution rate of aluminum). The tip of the probe wears in diluted NaOH solution (dissolution of silicon tip) Rgd with diamond tip is than that with silicon tip in Solutions I and III, showing a long service life Fabrication of micro-dot arrays and micro-walls of acrylic acid/melamine resin on aluminum : Fabrication of micro-dot arrays and micro-walls of acrylic acid/melamine resin on aluminum AFM probe processing, and electrophoretic deposition Anodic oxide films 15 nm thickness on aluminum scratched with an AFM probe containing acrylic acid/melamine resin nanoparticles to remove the anodic oxide film locally Scratching specimen was anodically polarized to deposit acrylic acid/melamine resin electrophoretically Resin deposition cured by heating Film removing behavior on open circuit : Film removing behavior on open circuit Fig. 2. (a) Three-dimensional and (b) AFM height images obtained for a specimen scratched on open circuit at F=20N and rs =50µms−1. The scratching was repeated twice (n = 2) in a line of 1m length Fig. 3. (a) Three-dimensional and (b) AFM height images obtained for a specimen scratched on open circuit at F=20µN and rs =50µms−1. The scratching was repeated ten times (n = 10) in a square 10mm×10mm shape. Resin deposition under potentiostatic and galvanostatic conditions afterscratching on open circuit : Resin deposition under potentiostatic and galvanostatic conditions afterscratching on open circuit Slide 12: Deposition of resin hydrophilic to hydrophobic properties Applied to many micro- and nanodevices (microprinting rolls, micro-bio-tips, micro electrochemical cells, and others) Deposit organic compounds at only film-removed areas Film removal on open circuit-contamination Film removal under polarization prevent deposition of organic (AFM probe process) Possible for micro-submicron pattern on Al by AFM and electrodeposition Nanopatterning of an organic monolayer covered Si (111) surfaces (scratching by AFM) : Nanopatterning of an organic monolayer covered Si (111) surfaces (scratching by AFM) Diamond-coated tip-organic monolayer covered Si surfaces to create nanostructures by electrodeposition. Organic layer (1-octadecene)- covalently attached hydrogen-terminated Si (1 1 1) surface Copper was deposited into the nanostructures-immersion plating / electrodeposition At optimal condition organic layer -mask for site selective patterning of Cu nanostructure on Si surface SEM and AEM-for characterization (a) AFM scratches Si coated (C18H36) 1µm space (b) height c.s scratches : (a) AFM scratches Si coated (C18H36) 1µm space (b) height c.s scratches Cu deposition in AFM induced nano scratches on 1-octadecene (C18H36) coated p-Si (1 1 1) surfaces.(10,15,&25s) SEM of Cu on n-Si (1 1 1) coated C18H36 AFM tip under,(a) 10 µN, (b) 40µN and (c) left 20µN right 10µN. : SEM of Cu on n-Si (1 1 1) coated C18H36 AFM tip under,(a) 10 µN, (b) 40µN and (c) left 20µN right 10µN. SEM of Cu on p-Si (1 1 1) coated C18H36 (10–20µ N). Slide 16: Nanostructures- nanopatterned on Si-scratching by AFM Organic monolayer of C18H36 -efficient resist- copper immersion platting and electrodeposition coherent nanoscale lines of well-connected copper wires by scratching AES for characterization Scratching force influence deposition of nanostructures Nanoscale patterning and deformation of soft matter : Nanoscale patterning and deformation of soft matter AFM for surface nanopatterning, nanoscale deformation of soft carbon-based thin films and polymeric ( PET) membranes. Contact force pulses to the samples by Si rectangular cantilevers-high spring constant Nanomechanical properties -applied force and pressure for plastic deformation of the surface (depth-sensing Nanoindentation) permanent nanoscale plastic deformation of the material surface by exerting Fa and Pa by the tip (AFM nanolithography) Surface modified materials exhibits biocompatibility Slide 18: Topography images of the samples before (upper row) and after (lower row) SPM nanolithography Slide 19: Semi contact mode-AFM for Well-shaped patterns by a Si tip, diamond indenter tip for nanoindentation Well defined shapes like pits and lines, were made Patterned structures were correlated with the nanolithography parameters (e.g. applied force). Geometry and dimensional characteristics comprise the data storage capacity Results and discussion : Results and discussion Nanopatterning is an important technique for micro machine-electric devices and high density recording systems Photolithography involves many steps and uses toxic reagents Possible to fabricate micro- and submicron-patterns on many materials related to the coating of several nanostructures Immersion plating and electro deposition is used for depositing the fine nanostructures Handling of soft material nanopatterning Conclusion : Conclusion Nanopattern by AFM immobilization with proteins and peptides-diagnostic protein nanoarrays control over the cell/biomaterial interface Development of bionanopatterning by AFM pace into better resolution, drug delivery, diagnostics, biocompatibility, and cost. Development of novel bio-nanoengineered surfaces References : References Z. Kato et al. / Surface and Coatings Technology 169 –170 (2003) 195–198 S. Kurokawa et al. / Electrochimica Acta xxx (2008) xxx–xxx Y. Zhang et al. / Electrochimica Acta 51 (2006) 3674–3679 S. Kassavetis et al. / Materials Science and Engineering C 27 (2007) 1456–1460

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